From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity

Blocking the lateral film growth at the nanoscale in area-selective atomic layer deposition.

Area-selective atomic layer deposition (ALD) allows the growth of highly uniform thin inorganic films on certain parts of the substrate while preventing the film growth on other parts. Although the selective ALD growth is working well at the micron and submicron scale, it has failed at the nanoscale, especially near the interface where there is growth on one side and no-growth on the other side...

Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry

Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation

Area-selective atomic layer deposition (ALD) is envisioned to play a key role in next-generation semiconductor processing and can also provide new opportunities in the field of catalysis. In this work, we developed an approach for the area-selective deposition of metal oxides on noble metals. Using O2 gas as co-reactant, area-selective ALD has been achieved by relying on the catalytic dissociat...

Controlled Synthesis of Pd/Pt Core Shell Nanoparticles Using Area-selective Atomic Layer Deposition

We report an atomic scale controllable synthesis of Pd/Pt core shell nanoparticles (NPs) via area-selective atomic layer deposition (ALD) on a modified surface. The method involves utilizing octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs) to modify the surface. Take the usage of pinholes on SAMs as active sites for the initial core nucleation, and subsequent selective depositio...

Toward 3D Solid-State Batteries via Atomic Layer Deposition Approach

3D solid-state batteries are receiving great attentions as on-board power supply systems for small-dimension devices, due to their high power and energy densities. However, the fabrication of 3D solid-state batteries has been a formidable challenge due to the limitation of conventional thin-film techniques. Recently, atomic layer deposition (ALD) has emerged as a powerful approach toward 3D sol...